Company Filing History:
Years Active: 1993-1995
Title: Edward J Rode: Innovator in Chemical Vapor Deposition Technologies
Introduction
Edward J Rode is a notable inventor based in San Ramon, CA (US), recognized for his contributions to the field of chemical vapor deposition (CVD) technologies. With a total of 2 patents, he has made significant advancements that enhance the manufacturing processes of integrated circuits.
Latest Patents
Rode's latest patents include innovative methods for improving film uniformity and deposition processes. One of his key inventions is a system for depositing a film on a substrate in a CVD process, which utilizes a second-source injection sub-system for injecting a control gas. This system allows for the control of the deposition rate based on the concentration of the control gas, thereby altering the thickness uniformity of the film. Additionally, his invention applies to dry etching with reactive gas, where the etching rate is also controlled by the provision of a control gas.
Another significant patent is for a low-temperature low-stress blanket tungsten film deposition process. This process operates at temperatures below 440 degrees Celsius and is designed for voidless fill of vias as small as 0.5 microns in width. It achieves resistivity levels well below 100 micro-ohms per square and maintains film stress generally in the mid 7E+09 dynes per square centimeter and below, while avoiding the use of nitrogen in the process.
Career Highlights
Edward J Rode has established himself as a key figure in the field of semiconductor manufacturing. His work at Genus, Inc. has been instrumental in developing advanced deposition techniques that are crucial for the production of high-performance integrated circuits.
Collaborations
Rode has collaborated with notable colleagues such as Johannes J Schmitz and Sien G Kang, contributing to the advancement of innovative technologies in the semiconductor industry.
Conclusion
Edward J Rode's contributions to chemical vapor deposition technologies have significantly impacted the manufacturing processes of integrated circuits. His innovative patents reflect his expertise and commitment to advancing the field.