Edward Budiarto

Title: Edward Budiarto: Innovator in Optical Metrology

Introduction

Edward Budiarto is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of optical metrology, particularly in the area of film thickness measurements. His innovative approach has led to the development of a unique optical metrology model that enhances measurement accuracy.

Latest Patents

Edward Budiarto holds a patent for "Optical Metrology Models for In-Line Film Thickness Measurements." This patent describes an optical metrology model that generates in-line thickness measurements of a film overlying non-ideal structures on a substrate. The process involves performing pre-measurements before the film deposition and post-measurements afterward. These measurements are conducted at various polarization angles and orientations of the substrate. The differences in reflectance between the pre- and post-measurements are analyzed to identify conditions that minimize the influence of non-ideal structures. The model is further refined using machine-learning algorithms based on the identified parameters.

Career Highlights

Throughout his career, Edward has worked with prominent companies in the technology sector. He has been associated with Applied Materials Israel Limited and Applied Materials Italia S.r.l., where he contributed to advancements in optical metrology and related technologies.

Collaborations

Edward has collaborated with talented individuals in his field, including Eric Chin Hong Ng and Sergey Starik. These collaborations have fostered innovation and the sharing of ideas, further enhancing the impact of his work.

Conclusion

Edward Budiarto's contributions to optical metrology exemplify the spirit of innovation in technology. His patented work on film thickness measurements showcases his expertise and commitment to advancing measurement techniques.