Edward Alan Dein

Title: Edward Alan Dein: Innovator in Dielectric Film Deposition

Introduction

Edward Alan Dein is a notable inventor based in Horsham, PA (US). He holds a total of 3 patents that showcase his contributions to the field of semiconductor technology. His work primarily focuses on methods and apparatuses for dielectric film deposition, which are crucial for the advancement of integrated circuits.

Latest Patents

One of his latest patents is the "Dielectric film deposition method and apparatus." This innovation involves producing dielectric layers comprising silicon oxide with a consistent thickness across a wafer through a plasma-deposition method. The process supports a wafer on a surface that extends significantly beyond its edge, allowing for further processing through localized etching of windows or vias. This uniform layer thickness is particularly beneficial when timed etching is employed, ensuring uniformity of etched openings.

Another significant patent is the "Multilayered Al-alloy structure for metal conductors." This patent describes a silicon integrated circuit (IC) that includes an aluminum-based layer deposited as a composite of sublayers with different compositions. The first sublayer consists of an Al-Si-based alloy designed to prevent substantial silicon migration, while the second sublayer, positioned above the first, comprises an aluminum-based alloy with minimal silicon to mitigate precipitation-induced issues.

Career Highlights

Edward Alan Dein has made significant strides in his career, particularly through his work at Lucent Technologies Inc. His innovative approaches to dielectric film deposition have contributed to advancements in semiconductor manufacturing processes.

Collaborations

Throughout his career, Edward has collaborated with notable colleagues, including Cheryl Anne Bollinger and Sailesh Mansinh Merchant. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in the field.

Conclusion

Edward Alan Dein is a distinguished inventor whose work in dielectric film deposition has made a lasting impact on semiconductor technology. His patents reflect his commitment to innovation and excellence in the field.