Marburg, Germany

Eduard Sterzer

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Philipps-Universität Marburg. Active years: 2019.


% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Eduard Sterzer: Innovator in Semiconductor Technology

Introduction

Eduard Sterzer is a notable inventor based in Marburg, Germany. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent that addresses the production of multinary, homogeneous, and ultrapure semiconductors.

Latest Patents

Eduard Sterzer holds a patent for the "Use of at least one binary group 15 element compound, a 13/15 semiconductor layer and binary group 15 element compounds." This invention provides a method for utilizing binary group 15 element compounds in a vapor deposition process. The compounds are defined by the general formula RRE-E'RR(I) or RE(E′RR)2 (II), where R, R, R, and R are independently selected from hydrogen, alkyl radicals (C1-C10), and aryl groups. The invention notably excludes hydrazine and its derivatives, allowing for the production of semiconductors at relatively low process temperatures while minimizing nitrogen contamination.

Career Highlights

Eduard Sterzer is affiliated with Philipps-Universität Marburg, where he continues to advance research in semiconductor technology. His work has been instrumental in developing methods that enhance the purity and reproducibility of semiconductor production.

Collaborations

Throughout his career, Eduard Sterzer has collaborated with esteemed colleagues such as Carsten Von Haenisch and Kerstin Volz. These partnerships have contributed to the advancement of research and innovation in the field.

Conclusion

Eduard Sterzer's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work not only enhances the production processes but also significantly reduces contamination, paving the way for future advancements in semiconductor applications.

Profile summary based on public USPTO records.
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