Edith Goldner

Title: Edith Goldner: Innovator in Process Chemistry

Introduction

Edith Goldner is a prominent inventor based in Sunnyvale, CA (US). She has made significant contributions to the field of process chemistry, particularly in the area of high-density plasma chemical vapor deposition (HDP CVD) films. Her innovative work has led to advancements in the control of deposition profiles, which are crucial for various applications in semiconductor manufacturing.

Latest Patents

Edith Goldner holds 1 patent for her invention titled "Deposition profile modification through process chemistry." This patent discloses methods for modifying the topography of HDP CVD films by altering the composition of the reactive mixture. The methods she developed allow for deposition profile control that is independent of the film deposition rate. By focusing on changes in the process chemistry of the HDP CVD system, rather than hardware modifications, her invention enables the modification of local deposition rates on the wafer. Specifically, the invention provides methods for altering the film profile by adjusting the composition of the reactive gas mixture, particularly the hydrogen content. This decouples deposition profile and uniformity from deposition rate, allowing for precise control without the need for hardware changes.

Career Highlights

Edith has had a successful career at Novellus Systems Incorporated, where she has been instrumental in advancing the company's technological capabilities. Her expertise in process chemistry has positioned her as a key player in the development of innovative solutions for the semiconductor industry.

Collaborations

Throughout her career, Edith has collaborated with notable colleagues, including George D Papasouliotis and Vishal Gauri. These collaborations have further enhanced her contributions to the field and have fostered a culture of innovation within her team.

Conclusion

Edith Goldner's work in process chemistry and her innovative patent demonstrate her significant impact on the semiconductor industry. Her ability to control deposition profiles through chemistry rather than hardware modifications showcases her forward-thinking approach to problem-solving. Her contributions continue to influence advancements in technology and manufacturing processes.