Location History:
- Redeburg, DE (2000)
- Radeburg, DE (2001 - 2007)
Company Filing History:
Years Active: 2000-2007
Title: Eckhard Marx: Innovator in Noninvasive Measurement Technologies
Introduction
Eckhard Marx is a notable inventor based in Radeburg, Germany. He has made significant contributions to the field of measurement technologies, holding a total of 7 patents. His work primarily focuses on noninvasive methods for characterizing embedded micropatterns, which have applications in semiconductor manufacturing.
Latest Patents
One of his latest patents is a noninvasive method for characterizing and identifying embedded micropatterns. This invention relates to a technique that allows for the noninvasive characterization of micropatterns hidden beneath the surface of a wafer, down to a depth of 100 micrometers. The micropatterns are identified using reference micropatterns from a previously produced library, utilizing their specific ellipsometric parameters. Another significant patent involves a measurement configuration that combines a measurement device with a vehicle, enabling mobile metrology in fabrication facilities. This configuration includes peripheral equipment such as a device transfer unit for FOUPs in semiconductor manufacturing, an electronic control system, and optionally a vacuum pump. This innovative setup aims to reduce bottlenecks in equipment qualification during fast ramp-up phases in semiconductor manufacturing, ultimately saving costs.
Career Highlights
Eckhard Marx has worked with prominent companies, including Infineon Technologies AG. His experience in the industry has allowed him to develop cutting-edge technologies that enhance measurement processes in semiconductor fabrication.
Collaborations
Throughout his career, Eckhard has collaborated with notable colleagues such as Detlef Gerhard and Martin Peiter. Their combined expertise has contributed to the advancement of measurement technologies.
Conclusion
Eckhard Marx's innovative work in noninvasive measurement technologies has made a significant impact in the semiconductor industry. His patents reflect a commitment to improving efficiency and reducing costs in manufacturing processes.
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