The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2005
Filed:
Oct. 30, 2001
Martin Peiter, Dresden, DE;
Eckhard Marx, Radeburg, DE;
Karl E. Mautz, Round Rock, TX (US);
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
The present invention relates to a scribing method for wafers (), wherein a defined beam () is directed onto the wafer () by means of a beam generator means () so as to remove some wafer material from a wafer region. The invention also relates to a wafer-scribing device including a wafer mount () and a beam generator means () by means of which at least one defined beam can be directed onto the wafer (). The inventive method is distinguished by the by the further step of generating a first radiation pulse having a predeterminable energy density and used to create a comparatively deep pit () in the wafer (). The inventive wafer scribing means is distinguished by the provision that a radiation pulse can be generated by means of which a comparatively deep pit () can be created in the wafer ().