Company Filing History:
Years Active: 2020-2025
Title: Innovations of Ebony L Mays
Introduction
Ebony L Mays is a prominent inventor based in Hillsboro, OR (US), known for her significant contributions to the field of integrated circuit technology. With a total of 10 patents to her name, she has made remarkable advancements that enhance the manufacturing processes of integrated circuits.
Latest Patents
One of her latest patents is titled "Filling openings by combining non-flowable and flowable processes." This patent discloses methods for manufacturing integrated circuit components using a combination of non-flowable and flowable processes to fill openings with dielectric material. The method maximizes the strengths of both processes while minimizing their drawbacks. Another notable patent is "Fin end plug structures for advanced integrated circuit structure fabrication." This invention focuses on the fabrication of advanced integrated circuit structures, particularly at the 10 nanometer node and smaller. It describes an integrated circuit structure that includes isolation structures and gate structures designed to optimize performance.
Career Highlights
Ebony L Mays is currently employed at Intel Corporation, where she applies her expertise in integrated circuit technology. Her work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout her career, Ebony has collaborated with notable colleagues, including Jeanne Luce and Byron Ho, contributing to various innovative projects within the industry.
Conclusion
Ebony L Mays is a trailblazer in the field of integrated circuit technology, with a strong portfolio of patents that reflect her innovative spirit and dedication to advancing the industry. Her contributions continue to shape the future of semiconductor manufacturing.