Company Filing History:
Years Active: 2014
Title: Ebo Kwabena Gyan Croffie: Innovator in Integrated Circuit Design
Introduction
Ebo Kwabena Gyan Croffie is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of integrated circuit design, particularly in the area of topography proximity effects. His innovative approach has led to advancements that enhance the accuracy and efficiency of circuit simulations.
Latest Patents
Ebo holds a patent for a method titled "Compact and accurate wafer topography proximity effect modeling for full chip simulation." This patent describes a method for correcting topography proximity effects (TPE) in integrated circuit (IC) design. The method involves dividing the IC design into multiple levels in the z-direction, allowing for the decomposition of each level into various elementary geometries. These geometries can include top view, cross-sectional, half-plane, and those with single or multiple slope sides. By comparing these geometries to primitives in a library, a transfer matrix is generated, which aids in calculating a disturbance matrix. This matrix captures the spectrum of a reflective electric field from an incident electric field, facilitating wave propagation through a photoresist layer for TPE correction.
Career Highlights
Ebo is currently employed at Synopsys, Inc., where he applies his expertise in integrated circuit design. His work focuses on improving the accuracy of simulations, which is crucial for the development of advanced electronic devices. With a patent portfolio that includes 1 patent, Ebo has established himself as a key player in his field.
Collaborations
Ebo has collaborated with talented individuals such as Hongbo Zhang and Nikolay Voznesenskiy. These partnerships have contributed to the advancement of innovative solutions in integrated circuit design.
Conclusion
Ebo Kwabena Gyan Croffie is a distinguished inventor whose work in integrated circuit design has made a significant impact. His innovative methods for correcting topography proximity effects are paving the way for more accurate and efficient electronic devices.