Changwon-si, South Korea

Dusik Bae

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.2

ph-index = 1


Company Filing History:


Years Active: 2019-2024

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2 patents (USPTO):Explore Patents

Title: Innovations of Dusik Bae

Introduction

Dusik Bae is a notable inventor based in Changwon-si, South Korea. He has made significant contributions to the field of technology, particularly in the development of pollutant detection devices and semiconductor fabrication methods. With a total of two patents to his name, Bae's work reflects a commitment to advancing environmental monitoring and semiconductor technology.

Latest Patents

Dusik Bae's latest patents include a pollutant detection device and a monitoring system. This detection device features a transfer mechanism that travels along a rail while gripping a carrier. The detection structure mounted on the carrier includes a collector for sucking in air, a detector with multiple sensors, and sensor control boards that generate data regarding the type and concentration of pollutants in the air. His second patent involves a method of processing a substrate and fabricating a semiconductor device. This method includes forming a mask layer on a substrate, inspecting it, and creating a mask pattern based on inspection results, utilizing Raman spectrum analysis to detect defects.

Career Highlights

Dusik Bae is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to contribute to innovative projects that push the boundaries of technology and environmental science.

Collaborations

Some of his notable coworkers include Euihyun Roh and Sangyoon Shin, who have collaborated with him on various projects within the company.

Conclusion

Dusik Bae's contributions to technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor in the field. His innovative approaches to pollutant detection and semiconductor fabrication are paving the way for advancements in these critical areas.

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