This inventor holds 1 USPTO granted patent. Top assignee: National Taiwan University. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: Innovations of Duo-Ru Chang in Stylus Technology
Introduction: Duo-Ru Chang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of stylus technology, particularly with his innovative designs and manufacturing methods. His work has implications for various applications, enhancing the functionality and precision of stylus devices.
Latest Patents: Duo-Ru Chang holds a patent for a "Self-aligned stylus with high-sphericity and method of manufacturing the same." This patent describes a method that includes forming a polymeric layer on a substrate, placing a sphere on the polymeric layer, and softening the polymeric layer to allow a portion of the sphere to sink into it. The process further involves forming a specific light-absorbing layer, illuminating the sphere and the light-absorbing layer with specific light, and subsequently exposing the polymeric layer to create an exposed portion and an unexposed portion. The unexposed portion is then removed after baking the polymeric layer. This innovative approach results in a self-aligned stylus with high sphericity, which is crucial for precision in various applications.
Career Highlights: Duo-Ru Chang is affiliated with National Taiwan University, where he continues to advance research and development in stylus technology. His work has garnered attention for its practical applications and innovative methodologies. With a patent count of 1 patent, he stands out as a key figure in his field.
Collaborations: Duo-Ru Chang has collaborated with notable colleagues, including Po-Jen Shih and Wen-Pin Shih. These collaborations have contributed to the advancement of technology in their respective areas of expertise.
Conclusion: Duo-Ru Chang's contributions to stylus technology exemplify the innovative spirit of modern inventors. His patent for a self-aligned stylus with high sphericity showcases his commitment to enhancing device functionality and precision. His work continues to influence the field and inspire future innovations.