The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Apr. 22, 2008
Wen-pin Shih, Taipei, TW;
Yao-chuan Tsai, Taipei, TW;
Duo-ru Chang, Taipei, TW;
Li-chi Tsao, Taipei, TW;
Ming-dao Wu, Taipei, TW;
Po-jen Shih, Taipei, TW;
Wen-Pin Shih, Taipei, TW;
Yao-Chuan Tsai, Taipei, TW;
Duo-Ru Chang, Taipei, TW;
Li-Chi Tsao, Taipei, TW;
Ming-Dao Wu, Taipei, TW;
Po-Jen Shih, Taipei, TW;
National Taiwan University, Taipei, TW;
Abstract
A method of manufacturing a self-aligned stylus with high sphericity includes the steps of: forming a polymeric layer on a substrate; placing a sphere on the polymeric layer; softening the polymeric layer to make a portion of the sphere sink into the polymeric layer; forming a specific light absorbing layer on the polymeric layer; illuminating the sphere and the specific light absorbing layer with specific light such that the specific light is focused by the sphere to expose the polymeric layer to form an exposed portion and an unexposed portion; removing the specific light absorbing layer; and baking the polymeric layer and then removing the unexposed portion. A self-aligned stylus with high sphericity is also disclosed.