Dun-Jen Teng

Title: Dun-Jen Teng: Innovator in Semiconductor Technology

Introduction

Dun-Jen Teng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of current leakage suppression.

Latest Patents

Dun-Jen Teng holds a patent for a semiconductor device and method of operating the same, which includes a structure for suppressing current leakage. This innovative structure comprises a substrate of a first conductivity type, a well region of the same conductivity type, an isolation structure, and a PN junction diode. The well region is strategically placed within the substrate, while the isolation structure is positioned on the well region. The PN junction diode is designed to effectively suppress current leakage in the semiconductor device.

Career Highlights

Dun-Jen Teng is currently employed at Episil Technologies Inc., where he continues to advance his research and development efforts in semiconductor technology. His work has been instrumental in enhancing the performance and reliability of semiconductor devices.

Collaborations

Dun-Jen Teng has collaborated with notable colleagues, including Hsiao-Chia Wu and Chi-Jei Dai, contributing to various projects and innovations within the semiconductor field.

Conclusion

Dun-Jen Teng's contributions to semiconductor technology, particularly through his patented innovations, highlight his role as a key figure in the industry. His work continues to influence advancements in the field, showcasing the importance of innovation in technology.