Duming Zhang

Title: Duming Zhang: Innovator in Atomic Layer Deposition Technologies

Introduction

Duming Zhang is a prominent inventor based in Union City, CA (US). He has made significant contributions to the field of atomic layer deposition (ALD) and etch processes, holding a total of 5 patents. His work focuses on enhancing critical dimension control and reducing surface roughness in semiconductor manufacturing.

Latest Patents

Duming Zhang's latest patents include innovative methods and apparatuses for critical dimension (CD) control of substrate features. One notable patent describes techniques for etching to form a mask pattern on a substrate, followed by conformally depositing a passivation layer using ALD. This process increases the width of the mask pattern to the desired specifications. Another patent focuses on reducing roughness through integrated ALD and etch processes, which involve depositing a conformal layer on a mask to protect sidewalls and minimize roughness during subsequent etching.

Career Highlights

Throughout his career, Duming Zhang has worked with Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His expertise in ALD and etch technologies has positioned him as a key player in advancing semiconductor fabrication techniques.

Collaborations

Duming Zhang has collaborated with notable professionals in his field, including Xiang Zhou and Yoshie Kimura. These collaborations have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Duming Zhang's contributions to atomic layer deposition and etch processes have significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in this critical field.