Duk-Chul Yun

This inventor holds 3 USPTO granted patents. Top assignees: Applied Materials, Inc., Lg Display Co., Ltd.. Active years: 2007-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Duk-Chul Yun. Retrieved from https://idiyas.com/inventor/duk-chul-yun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 3

% Patents Active = 66.7

Average Co-Inventor Count = 7.2

ph-index = 2

Forward Citations = 6(Granted Patents)

Company Filing History:

2 out of 14,482

Applied Materials, Inc.

Years Active: 2007-2015

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3 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8993043 - Method for fabricating color filter layer of liquid crystal display device and method for fabricating liquid crystal display device using the same (2015-03-31),

2. 7915114 - Low temperature process for TFT fabrication (2011-03-29),

3. 7300829 - Low temperature process for TFT fabrication (2007-11-27),

Title: Inventor Duk-Chul Yun: Revolutionizing Technology in Seoul

Introduction: Duk-Chul Yun is a visionary inventor based in Seoul, South Korea, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Duk-Chul Yun holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Duk-Chul Yun has worked with leading tech companies in South Korea, spearheading research and development projects that have led to significant advancements in various industries.

Collaborations: Throughout his career, Duk-Chul Yun has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Duk-Chul Yun's passion for pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and pave the way for a more technologically advanced future.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]