Applied Materials, Inc.

Lg Display Co., Ltd.

Duk-Chul Yun

Quanyuan Shang

Woong-Kwon Kim

Dong-Kil Yim

William Reid Harshbarger

Takako Takehara

Mark Hsiao

Youn-Gyung Chang

Youn-Gyoung Chang

Seung-Hee Nam

Oh-Nam Kwon

Soon-Sung Yoo

Heung-Lyul Cho

A method for fabricating color filter layer of an LCD comprises forming a plurality of black matrixes separated at certain intervals on a color filter substrate, and forming R, G and B color filter layers by using a plurality of needles between the plurality of black matrixes on the color filter substrate.

Method for fabricating color filter layer of liquid crystal display device and method for fabricating liquid crystal display device using the same

Method of fabricating a thin-film transistor (TFT) in which a gate metal is deposited onto a substrate in order to form the gate of the thin-film transistor. The substrate may be an insulative substrate or a color filter. In a first method, the gate metal is subjected to an Hplasma. After subjecting the gate metal to an Hplasma, the gate insulating film is deposited onto the gate. In a second method, first and second layers of gate insulating film are respectively deposited on the gate at a first and second deposition rates. One layer is deposited under Hor argon dilution conditions and has improved insulating conditions while the other layer serves to lower the overall compressive stress of the dual layer gate insulator. In a third method, an nsilicon film is formed on a substrate by maintaining a flow of silane, phosphine and hydrogen gas into a processing chamber at substrate temperatures of about 300&#xb0; C. or less.

Low temperature process for TFT fabrication

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Seoul, South Korea

Duk-Chul Yun