Dujuan Li

Title: Dujuan Li: Innovator in Stencil-Avoidance Design

Introduction

Dujuan Li is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of electronic device design, particularly through his innovative patent related to stencil-avoidance design methods. His work aims to enhance the efficiency and accuracy of electronic device manufacturing.

Latest Patents

Dujuan Li holds a patent for a "Stencil-avoidance design method and device, electronic device and storage medium." This invention provides a method that includes obtaining multiple first regions and stencil aperture regions. It determines the shortest distance between selected regions and performs a collision test if necessary. This method improves the efficiency, accuracy, coverage, and comprehensiveness of stencil avoidance design.

Career Highlights

Dujuan Li is currently employed at Vayo (Shanghai) Technology Co., Ltd. His role involves applying his expertise in design methods to develop advanced electronic devices. His innovative approach has positioned him as a key player in the technology sector.

Collaborations

Dujuan Li collaborates with talented coworkers, including Pan Su and Shengjie Qian. Together, they work on various projects that push the boundaries of electronic design and technology.

Conclusion

Dujuan Li's contributions to stencil-avoidance design reflect his commitment to innovation in electronic device manufacturing. His patent showcases his ability to solve complex design challenges, making him a valuable asset in the technology industry.