The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
May. 31, 2021
Vayo (Shanghai) Technology Co., Ltd., Shanghai, CN;
Pan Su, Shanghai, CN;
Dujuan Li, Shanghai, CN;
Shengjie Qian, Shanghai, CN;
Jishuo Liu, Shanghai, CN;
VAYO (SHANGHAI) TECHNOLOGY CO., LTD., Shanghai, CN;
Abstract
A stencil-avoidance design method, a stencil-avoidance design device, an electronic device, and a non-transitory storage medium are provided. The method includes: obtaining a plurality of first regions and a plurality of first stencil aperture regions; determining whether a shortest distance between a selected first region of the plurality of first regions and a selected first stencil aperture region of the plurality of first stencil aperture regions is within a preset threshold range; further obtaining a second region and a second stencil aperture region if the shortest distance is within the preset threshold range, and then obtaining a third region; performing a collision step if a collision test is required, and obtaining a final stencil aperture region. The above method can improve the efficiency, accuracy, coverage, and comprehensiveness of the stencil avoidance design.