Gwangju, South Korea

Duck-Young Kim

This inventor holds 1 USPTO granted patent. Top assignee: Kwangju Institute of Science and Technology. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Duck-Young Kim. Retrieved from https://idiyas.com/inventor/duck-young-kim-kweccbu9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Innovations of Duck-Young Kim in Material Thickness Measurement

Introduction

Duck-Young Kim is an accomplished inventor based in Gwangju, South Korea. He has made significant contributions to the field of material measurement technology. His innovative approach focuses on utilizing the focal length of a lensed fiber to measure the thickness of various materials.

Latest Patents

Duck-Young Kim holds a patent for an "Apparatus for and method of measuring thickness of materials using the focal length of a lensed fiber." This invention provides a novel method for measuring material thickness by generating a Gaussian Beam with a lensed fiber. The apparatus detects the strength of the beam reflected from the material when focused on it. The thickness is then calculated based on the detected strength of the reflected beam. He has 1 patent to his name.

Career Highlights

Duck-Young Kim is affiliated with the Kwangju Institute of Science and Technology, where he conducts research and development in advanced measurement techniques. His work has garnered attention for its practical applications in various industries.

Collaborations

Duck-Young Kim collaborates with notable colleagues, including Young Choon Yook and Yong Woo Park. Their combined expertise enhances the research and development efforts at their institution.

Conclusion

Duck-Young Kim's innovative work in measuring material thickness showcases his dedication to advancing technology in this field. His contributions are valuable to both academic and industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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