This inventor holds 1 USPTO granted patent. Top assignee: Eastman-Kodak Company. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Duane M Courtney: Innovator in Digital Imaging Measurement
Introduction
Duane M Courtney is a notable inventor based in Webster, NY (US). He has made significant contributions to the field of digital imaging measurement. His innovative work has led to the development of a patented apparatus that enhances the accuracy of measuring surface profiles.
Latest Patents
Duane M Courtney holds a patent for an "Apparatus and method for measuring digital imager, package and wafer bow and deviation from flatness." This apparatus is designed to measure the surface profile of a sample. It includes a fixture for locating a surface of a transparent optical flat relative to the sample's surface. The system utilizes a low-coherence light interferometer with an optical probe coupled to an XY scanning frame. This setup scans the surface of the sample through the transparent optical flat, producing interferometric data signals that represent the distances between the optical flat surface and the sample surface. A computer system processes these signals to generate a surface profile using a best fit to a plane.
Career Highlights
Duane M Courtney is associated with Eastman Kodak Company, where he applies his expertise in digital imaging technologies. His work has been instrumental in advancing measurement techniques within the industry.
Collaborations
Throughout his career, Duane has collaborated with notable colleagues, including Michael Alan Marcus and Thomas F Kaltenbach. These partnerships have contributed to the development of innovative solutions in the field.
Conclusion
Duane M Courtney's contributions to digital imaging measurement exemplify the impact of innovation in technology. His patented apparatus represents a significant advancement in the accuracy of surface profile measurements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
