This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Mentor Graphics Corporation, Other. Active years: 2008-2011.
Company Filing History:

Years Active: 2008-2011
Title: The Innovative Contributions of Dragos S Dudau
Introduction
Dragos S Dudau is a notable inventor based in Cupertino, CA (US). He has made significant contributions to the field of optical proximity correction, holding 2 patents that showcase his expertise and innovative thinking.
Latest Patents
One of his latest patents is titled "Selective optical proximity layout design data correction." This invention involves a repair flow initiated after layout design data has been modified using an optical proximity correction (OPC) process. The flow includes analyzing the modified data to identify potential print errors, forming regions around these errors, and performing a subsequent OPC process with different parameters. This iterative process ensures that any new potential print errors are addressed effectively.
Another significant patent is "Dense OPC," which outlines a method for calculating process conditions for performing optical and process correction on layout designs. This method estimates process conditions on a uniform grid within a layout database, creating contour curves that are compared against layout features to determine edge placement errors. Corrections can then be made based on these errors, enhancing the overall design accuracy.
Career Highlights
Throughout his career, Dragos has worked with various companies, including Mentor Graphics Corporation. His experience in the industry has allowed him to develop and refine his innovative ideas, contributing to advancements in optical proximity correction technologies.
Collaborations
Dragos has collaborated with notable individuals in his field, including Nicolas Bailey Cobb and James C Word. These collaborations have likely enriched his work and led to further innovations in his area of expertise.
Conclusion
Dragos S Dudau's contributions to optical proximity correction through his patents and career experiences highlight his role as an influential inventor. His work continues to impact the field, showcasing the importance of innovation in technology.