Dragon Lu

Title: Dragon Lu: Innovator in Carbon Ion Implantation Technology

Introduction

Dragon Lu is a notable inventor based in Miaoli County, Taiwan. He has made significant contributions to the field of carbon ion implantation technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of dopant gas delivery systems.

Latest Patents

Dragon Lu holds a patent titled "Storage and sub-atmospheric delivery of dopant compositions for carbon ion implantation." This invention provides a supply source for delivering a CO-containing dopant gas composition. The composition includes a controlled amount of a diluent gas mixture, such as xenon and hydrogen, which are provided at controlled volumetric ratios. This ensures optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, it can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path. This allows for a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus. Dragon Lu has 1 patent to his name.

Career Highlights

Dragon Lu is currently employed at Praxair Technology, Inc., where he continues to innovate in the field of gas delivery systems. His work focuses on improving the efficiency and effectiveness of carbon ion implantation processes.

Collaborations

He has collaborated with notable colleagues, including Ashwini K Sinha and Douglas Charles Heiderman, who contribute to the advancement of technology in their respective fields.

Conclusion

Dragon Lu's contributions to carbon ion implantation technology exemplify the impact of innovative thinking in the field of engineering. His patent reflects a commitment to enhancing the performance of dopant gas delivery systems, showcasing the importance of innovation in modern technology.