The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Dec. 20, 2013
Ashwini K. Sinha, East Amherst, NY (US);
Douglas C. Heiderman, Akron, NY (US);
Lloyd A. Brown, East Amherst, NY (US);
Serge M. Campeau, Lancaster, NY (US);
Robert Shih, HsinChu, TW;
Dragon LU, Miaoli County, TW;
Wen-pin Chiu, Hsin-chu County, TW;
Chien-kang Kao, New Taipei, TW;
Ashwini K. Sinha, East Amherst, NY (US);
Douglas C. Heiderman, Akron, NY (US);
Lloyd A. Brown, East Amherst, NY (US);
Serge M. Campeau, Lancaster, NY (US);
Robert Shih, HsinChu, TW;
Dragon Lu, Miaoli County, TW;
Wen-Pin Chiu, Hsin-chu County, TW;
Chien-Kang Kao, New Taipei, TW;
PRAXAIR TECHNOLOGY, INC., Danbury, CT (US);
Abstract
A supply source for delivery of a CO-containing dopant gas composition is provided. The composition includes a controlled amount of a diluent gas mixture such as xenon and hydrogen, which are each provided at controlled volumetric ratios to ensure optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, the composition can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path to allow a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus.