Location History:
- Beaverton, OR (US) (2003)
- Durham, NC (US) (2004 - 2009)
Company Filing History:
Years Active: 2003-2009
Title: Douglas W Barlage: Innovator in Semiconductor Technology
Introduction
Douglas W Barlage is a prominent inventor based in Beaverton, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on innovative devices and methods that enhance the performance and efficiency of semiconductor components.
Latest Patents
One of Barlage's latest patents is titled "Tri-gate devices and methods of fabrication." This invention describes a semiconductor device that comprises a carbon nanotube body with a top surface and laterally opposite sidewalls formed on a substrate. A gate dielectric layer is formed on the top surface and sidewalls of the carbon nanotube body. Additionally, a gate electrode is created on the gate dielectric on the top surface and adjacent to the gate dielectric on the sidewalls. Another patent under the same title details a similar semiconductor device, but it utilizes a semiconductor body instead of a carbon nanotube body, showcasing Barlage's versatility in semiconductor design.
Career Highlights
Douglas W Barlage has had a distinguished career at Intel Corporation, where he has been instrumental in advancing semiconductor technologies. His innovative approaches have led to the development of cutting-edge devices that are crucial for modern electronics. Barlage's expertise in semiconductor fabrication methods has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Barlage has collaborated with notable colleagues, including Robert S Chau and Jack T Kavalieros. These partnerships have fostered a creative environment that has resulted in groundbreaking advancements in semiconductor technology.
Conclusion
Douglas W Barlage is a significant contributor to the field of semiconductor innovation. His patents and work at Intel Corporation reflect his commitment to advancing technology and improving device performance. His contributions will continue to influence the semiconductor industry for years to come.