Douglas M Reber

Title: Douglas M Reber: Innovator in Semiconductor Technology

Introduction

Douglas M Reber is a notable inventor based in St. Ismier, France. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is for a semiconductor device that features an organic anti-reflective coating (ARC) and the method for its implementation. This innovation involves a patterning stack above a conductive material that is to be etched. A patterned photoresist layer is utilized to pattern an underlying tetraethyl-ortho-silicate (TEOS) layer, which is deposited at a lower temperature than conventional methods. The low-temperature TEOS layer is positioned over the organic ARC, which is in turn over the conductive layer. This configuration provides several advantages, including improved adhesion between the organic ARC and the photoresist, low defectivity, and the ability to function as a hard mask. Additionally, it serves as a phase shift layer that, in combination with the organic ARC, effectively reduces undesired reflection.

Career Highlights

Throughout his career, Douglas M Reber has worked with prominent companies in the semiconductor industry, including Freescale Semiconductor, Inc. and Advanced Micro Devices Corporation. His experience in these organizations has allowed him to develop and refine his innovative approaches to semiconductor technology.

Collaborations

Some of his notable coworkers include Mark Douglas Hall and Kurt H Junker. Their collaboration has contributed to the advancement of semiconductor technologies and innovations.

Conclusion

Douglas M Reber's contributions to semiconductor technology through his patents and career achievements highlight his role as a significant inventor in the field. His work continues to influence the development of more efficient semiconductor devices.