Douglas D Do

Title: Douglas D. Do: Semiconductor Measurement and Pattern Recognition

Introduction

Douglas D. Do is an inventor associated with Boise, Idaho, and Micron Technology Incorporated. His patent work includes methods for measuring semiconductor-device features and improving pattern recognition during defect inspection. He holds 5 patents.

Latest Patents

“Apparatus for Measuring Features of a Semiconductor Device” describes a method and apparatus for measuring feature dimensions on a semiconductor surface. It uses electron beams with different depths of focus, then analyzes the resulting electrical signals to determine lateral or vertical dimensions. The beams may be generated sequentially or through configurations involving separate electron guns or beam ports.

“Pattern Recognition with the Use of Multiple Images” presents an inspection method that builds a pattern from multiple selected images of an object. The system determines the images’ spatial relationships and uses them to identify the desired pattern while filtering out unwanted features that could interfere with defect detection.

Career Highlights

Do’s disclosed inventions address two important semiconductor-inspection challenges: accurately measuring device features and recognizing patterns while reducing the influence of irrelevant image details. These approaches support more targeted analysis in semiconductor manufacturing and inspection.

Collaborations

Do is associated with Micron Technology Incorporated. His listed coworkers include Ted Lyle Taylor and Jeff C. Johnson.

Conclusion

Douglas D. Do’s patent portfolio reflects work on semiconductor measurement and image-based pattern recognition, with applications relevant to device inspection and manufacturing.