Doohwan Park

Title: Doohwan Park: Innovator in Semiconductor Technology

Introduction

Doohwan Park is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device that enhances performance and reliability.

Latest Patents

Doohwan Park holds a patent for a semiconductor device that includes a via structure. This device features a substrate with a wiring layer positioned above it. The first via structure directly contacts the lower portion of the wiring layer, while the second via structure contacts the upper portion. The first via structure generates first stress in the wiring layer, and the second via structure generates second stress, which is of an opposite type to the first stress. This innovative design allows the first and second stresses to compensate for each other, improving the overall functionality of the wiring layer. He has 1 patent to his name.

Career Highlights

Doohwan Park is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. His contributions have been instrumental in advancing the company's technological capabilities.

Collaborations

Doohwan Park has collaborated with talented individuals such as Anthony Dongick Lee and Sangcheol Na. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Doohwan Park is a distinguished inventor whose work in semiconductor technology has made a significant impact. His innovative designs and collaborations continue to drive advancements in the field. His contributions are a testament to the importance of innovation in technology.