Osan, South Korea

DooByeong Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: DooByeong Park. Retrieved from https://idiyas.com/inventor/doobyeong-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: DooByeong Park: Innovator in Plasma Technology

Introduction

DooByeong Park is a notable inventor based in Osan-si, South Korea. He has made significant contributions to the field of plasma technology, particularly through his innovative patent.

Latest Patents

DooByeong Park holds a patent for "Plasma equipment and methods of using the same." This invention includes plasma equipment that features a chamber where plasma reactions occur. It also incorporates a detector that outputs a spectrum signal in response to light generated from the plasma reaction. Additionally, a plasma monitoring module is included to determine whether the spectrum signal contains an arcing signal or a hunting signal. Related methods are also provided, showcasing the versatility and application of his invention. He has 1 patent to his name.

Career Highlights

DooByeong Park is currently employed at Samsung Electronics Co., Ltd., a leading company in technology and innovation. His work at Samsung has allowed him to further develop his expertise in plasma technology and contribute to cutting-edge advancements in the field.

Collaborations

He has collaborated with talented coworkers, including Hyun Su Jun and YongKyu Kim, who share his passion for innovation and technology.

Conclusion

DooByeong Park's contributions to plasma technology through his patent demonstrate his commitment to innovation and excellence in his field. His work continues to influence advancements in technology, making him a significant figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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