Doo Young Gwak

Title: Innovations by Doo Young Gwak

Introduction

Doo Young Gwak is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to spectroscopic analysis and semiconductor device fabrication.

Latest Patents

His latest patents include a spectroscopic analysis method and a method for fabricating a semiconductor device using the same. The spectroscopic analysis method improves accuracy and correlation by receiving plasma light emitted from plasma to generate an emission spectrum. It detects multiple peak wavelengths from the emission spectrum, generates correlation factor time series, filters them, and analyzes the plasma using the filtered data. Additionally, he has developed a method for monitoring a semiconductor device fabrication process, which involves determining a normalization range of target byproducts produced during an etching process. This method estimates the results of the etching process and identifies potential failures based on specific indices derived from the byproducts.

Career Highlights

Doo Young Gwak is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the efficiency and reliability of semiconductor manufacturing processes.

Collaborations

He collaborates with talented coworkers, including Se Jin Oh and Tae Hyun Kim, contributing to a dynamic team environment that fosters innovation and creativity.

Conclusion

Doo Young Gwak's contributions to semiconductor technology through his patents reflect his dedication to advancing the field. His innovative methods are paving the way for more accurate and efficient semiconductor device fabrication.