Samsung Electronics Co., Ltd.

Doo Young Gwak

Tae Hyun Kim

Youngjoo Lee

Sang Ki Nam

Se Jin Oh

Sang Yoon Han

Taekyun Kang

Jae Ho Jang

Kyunggon You

Seongjin In

Jitae Park

Aekyung Kim

Jin Kyou Choi

Hyowon Bae

A spectroscopic analysis method having improved accuracy and correlation, a method for fabricating a semiconductor device using the same, and a substrate process system using the same are provided. The spectroscopic analysis method includes receiving plasma light emitted from plasma to generate an emission spectrum, detecting n (here, n is a natural number of 2 or more) peak wavelengths from the emission spectrum, generating a plurality of correlation factor time series from correlation factors between the peak wavelengths, filtering the plurality of correlation factor time series, and analyzing the plasma, using the filtered correlation factor time series.

Spectroscopic analysis method, method for fabricating semiconductor device using the same, and substrate process system using the same

Disclosed are a method of monitoring a semiconductor device fabrication process and a method of fabricating a semiconductor device using the same. The monitoring method may include determining a normalization range of a target byproduct, which is a measurement target of byproducts produced in a chamber by an etching process, the byproducts including the target byproduct and a non-target byproduct, the target byproduct including first and second target byproducts, which are respectively produced by and before the etching process on a to-be-processed layer, obtaining a first index from a ratio of the target byproduct to the non-target byproduct, obtaining a second index by subtracting an emission intensity of the second target byproduct from the first index, obtaining a third index by integrating the second index on a time interval, and estimating a result of the etching process and presence or absence of a failure, based on the third index.

Method of monitoring a semiconductor device fabrication process and method of fabricating a semiconductor device using the same

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Suwon-si, South Korea

Doo Young Gwak