Doo Hyun Kim

Title: Doo Hyun Kim: Innovator in Transistor Technology

Introduction

Doo Hyun Kim is a prominent inventor based in Goyang-si, South Korea. He has made significant contributions to the field of transistor technology, holding 2 patents that showcase his innovative approach to electronic components.

Latest Patents

One of his latest patents is a "Transistor panel having a good insulation property and a manufacturing method thereof." This invention includes a channel region made of an oxide of a first metal, with a source region and a drain region each comprising the first metal. The design ensures that the channel region is positioned between the source and drain regions, facilitating effective connectivity. An insulation layer is placed on the channel region, topped with an upper electrode. Additionally, an interlayer insulation layer is situated on the upper electrode, the source region, and the drain region. A barrier layer, which includes a first portion that contacts each of the source and drain regions, is also part of the design. Both the upper electrode and the barrier layer utilize a second metal, enhancing the overall functionality of the transistor panel.

Career Highlights

Doo Hyun Kim has worked with notable companies, including Samsung Display Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in display technology.

Collaborations

Throughout his career, he has collaborated with talented individuals such as Kwang Soo Lee and Shin Hyuk Yang. These partnerships have fostered a creative environment that has led to innovative solutions in the field of electronics.

Conclusion

Doo Hyun Kim's work in transistor technology exemplifies his commitment to innovation and excellence. His patents reflect a deep understanding of electronic components and their applications, making him a valuable contributor to the industry.