This inventor holds 1 USPTO granted patent. Top assignees: Semiconductor Manufacturing International (Beijing) Corporation, Semiconductor Manufacturing International (Shanghai) Corporation. Active years: 2016.
Company Filing History:
1 out of 948 
1 out of 1,750 
Years Active: 2016
Title: Donjiang Wang: Innovator in Semiconductor Fabrication
Introduction
Donjiang Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor fabrication. His innovative methods have the potential to enhance the performance and yield of semiconductor devices.
Latest Patents
Wang holds a patent for a "Method of fabricating miniaturized semiconductor or other device." This method utilizes the self-reorganization characteristics of an in-situ dissociable diblock copolymer to create a circular via hole that is centrally aligned with other device features. In one embodiment, this technique is applied to form a dual damascene structure. The self-reorganization of the diblock copolymer's monomer constituents ensures that the via hole is self-aligned with the trench position, thereby improving device performance and reducing fabrication costs. He has 1 patent to his name.
Career Highlights
Wang has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in both Beijing and Shanghai. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.
Collaborations
Wang has collaborated with various professionals in his field, including Steven Y Zhang, enhancing the innovation process through teamwork and shared expertise.
Conclusion
Donjiang Wang's contributions to semiconductor fabrication demonstrate his innovative spirit and commitment to advancing technology. His patented methods are paving the way for improved semiconductor devices, showcasing the importance of innovation in this critical industry.