This inventor holds 1 USPTO granted patent. Top assignee: Nanjing University. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations of Dongxu Fan in Two-Dimensional Material-Based Devices
Introduction
Dongxu Fan is a prominent inventor based in Nanjing, China. He has made significant contributions to the field of two-dimensional materials, particularly in the development of devices that utilize these materials for enhanced performance. His innovative work has led to the filing of a patent that addresses critical challenges in device architecture.
Latest Patents
Dongxu Fan holds a patent titled "Structure of two-dimensional material-based device having air-gap and method for preparing same." This invention involves a structure that comprises a substrate, a gate, a dielectric, a two-dimensional material-based film, and source and drain electrodes. The unique aspect of this design is the air-gap formed between the two-dimensional material-based film and the side wall of the dielectric on the gate, or between the dielectric and the gate itself. This configuration leverages the ductility and flexibility of two-dimensional materials to minimize the coupling between the gate and the source/drain electrodes. As a result, it effectively reduces parasitic capacitance and circuit delay. Furthermore, the structure allows for controlled contact regions of the source and drain electrodes with the two-dimensional material, maintaining low resistance and preserving electrical properties.
Career Highlights
Dongxu Fan is affiliated with Nanjing University, where he continues to advance research in the field of material science. His work has garnered attention for its practical applications in electronics and other related industries.
Collaborations
He collaborates with notable colleagues such as Xinran Wang and Weisheng Li, contributing to a dynamic research environment that fosters innovation and discovery.
Conclusion
Dongxu Fan's contributions to the field of two-dimensional materials and device architecture exemplify the potential of innovative research in advancing technology. His patent reflects a significant step forward in reducing circuit delays and enhancing device performance.