Fremont, CA, United States of America

Dongsoo Lee

This inventor holds 1 USPTO granted patent. Top assignee: Mattson Technology, Inc. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dongsoo Lee. Retrieved from https://idiyas.com/inventor/dongsoo-lee-nkw5ofgj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations by Dongsoo Lee in Plasma Processing Technology

Introduction

Dongsoo Lee is an accomplished inventor based in Fremont, CA (US). He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique patent that enhances the efficiency and effectiveness of plasma processing apparatus.

Latest Patents

Dongsoo Lee holds a patent for an "Inductively Coupled Plasma Source for Plasma Processing." This patent describes a plasma processing apparatus and methods that include a processing chamber designed to receive a process gas. The apparatus features a substrate holder within the chamber to hold a substrate and at least one dielectric window. A metal shield is positioned adjacent to the dielectric window, which includes a peripheral portion and a central portion. The processing apparatus incorporates a primary inductive element located external to the processing chamber, adjacent to the peripheral portion of the metal shield. Additionally, a secondary inductive element is situated between the central portion of the metal shield and the dielectric window. These inductive elements can perform distinct functions, possess different structural configurations, and operate at varying frequencies.

Career Highlights

Dongsoo Lee is currently employed at Mattson Technology, Inc., where he continues to innovate in the field of plasma processing. His work has been instrumental in advancing the technology used in various applications, making significant impacts in the industry.

Collaborations

Throughout his career, Dongsoo Lee has collaborated with notable colleagues, including Andreas Kadavanich and Vladimir Nagorny. These collaborations have fostered an environment of innovation and have contributed to the success of various projects.

Conclusion

Dongsoo Lee's contributions to plasma processing technology exemplify the spirit of innovation. His patent and ongoing work at Mattson Technology, Inc. highlight his commitment to advancing the field. His collaborations with esteemed colleagues further enhance the impact of his inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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