Shanghai, China

Dongjie Guo

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Abb Schweiz Ag. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dongjie Guo. Retrieved from https://idiyas.com/inventor/dongjie-guo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Dongjie Guo

Introduction

Dongjie Guo is a notable inventor based in Shanghai, China. He has made significant contributions to the field of container lidding systems. His innovative approach has led to the development of a unique system that enhances the efficiency of lidding containers with non-circular openings.

Latest Patents

Dongjie Guo holds 1 patent for his invention titled "System and method for lidding a container." This patent describes a system that includes a conveying device designed to transport a container, which features a non-circular opening. The system also incorporates a lid retaining assembly that maintains the lid in a fixed orientation, along with a container adjustment device that aligns the container's opening with the lid during the lidding process.

Career Highlights

Dongjie Guo is currently employed at Abb Schweiz AG, where he continues to innovate and develop new technologies. His work at this esteemed company allows him to collaborate with other talented professionals in the field.

Collaborations

Some of his coworkers include Junping Chen and Weiyang Shi, who contribute to the collaborative environment that fosters innovation and creativity.

Conclusion

Dongjie Guo's contributions to the field of container lidding systems exemplify the impact of innovative thinking in engineering. His patent showcases a practical solution to a common problem, reflecting his dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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