Rolla, MO, United States of America

Donghyun Kim

This inventor holds 1 USPTO granted patent. Top assignee: University of Missouri. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donghyun Kim. Retrieved from https://idiyas.com/inventor/donghyun-kim-6eopyney

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Donghyun Kim in Substrate Measurement Technology

Introduction

Donghyun Kim is an accomplished inventor based in Rolla, MO (US). He has made significant contributions to the field of substrate measurement technology. His innovative work has led to the development of a unique device that enhances the accuracy of property measurements in various substrates.

Latest Patents

Donghyun Kim holds a patent for a device titled "Transverse magnetic mode split post dielectric resonator." This invention comprises an enclosure, two resonators, and two probes designed for measuring properties of a substrate. The substrate features a top surface, and the enclosure defines a cavity for placing the substrate. The resonators extend into the cavity, while the probes are designed to excite a transverse magnetic mode signal within the cavity. This innovative approach allows for more precise measurements, which can be crucial in various applications.

Career Highlights

Donghyun Kim is affiliated with the University of Missouri, where he continues to advance his research and development efforts. His work has garnered attention for its practical applications and contributions to the field of engineering and technology.

Collaborations

Some of his notable coworkers include Xiaoning Ye and Chaofeng Li, who have collaborated with him on various projects, further enhancing the research output and innovation at the University of Missouri.

Conclusion

Donghyun Kim's contributions to substrate measurement technology exemplify the impact of innovative thinking in engineering. His patent and ongoing research efforts continue to pave the way for advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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