This inventor holds 1 USPTO granted patent. Top assignee: Synopsys, Inc.. Active years: 2013.
Company Filing History:
Years Active: 2013
Title: The Innovations of Donghwan Son
Introduction
Donghwan Son is a notable inventor based in Cupertino, CA (US). He has made significant contributions to the field of integrated-circuit design, particularly in the area of photolithography. His innovative approach has led to advancements that enhance the accuracy of semiconductor manufacturing processes.
Latest Patents
Donghwan Son holds a patent for a technique titled "Lithographically Enhanced Edge Determination." This patent involves modifying a target pattern associated with an integrated-circuit design to ensure that the resulting polygons achieve acceptable accuracy during the photolithographic process. The method includes adjusting polygon parameters to meet a cost function that aligns the modified target pattern with an estimated target pattern produced during fabrication. This innovation is crucial for improving the efficiency and precision of semiconductor die production.
Career Highlights
Donghwan Son is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys has allowed him to apply his expertise in integrated-circuit design and contribute to the development of cutting-edge technologies in the semiconductor industry.
Collaborations
Throughout his career, Donghwan Son has collaborated with esteemed colleagues, including Changqing Hu and Tatung Chow. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Donghwan Son's contributions to the field of integrated-circuit design and his innovative patent demonstrate his commitment to advancing semiconductor technology. His work continues to influence the industry and pave the way for future innovations.