Pyeongtaek, South Korea

Donghun Jeong

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Komico Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donghun Jeong. Retrieved from https://idiyas.com/inventor/donghun-jeong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovations of Donghun Jeong

Introduction

Donghun Jeong is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of plasma etching technology. His work focuses on enhancing the efficiency and effectiveness of photoplasma etching devices.

Latest Patents

Donghun Jeong holds a patent for a "Photoplasma etching apparatus having improved plasma-resistant and manufacturing method therefor using a thermal diffusion phenomenon of a rare-earth metal thin film." This invention provides a photoplasma etching device and a method of manufacturing it. The device is designed to improve plasma resistance through the deposition of a rare-earth metal thin film and surface heat treatment. It maintains optical transmittance, making it useful for analyzing the endpoint of an etching process.

Career Highlights

Donghun Jeong is currently employed at Komico Ltd., where he continues to innovate in the field of plasma etching technology. His work has garnered attention for its practical applications in various industries.

Collaborations

He collaborates with talented individuals such as Hyunchul Ko and Suntae Kim, contributing to advancements in their shared field of expertise.

Conclusion

Donghun Jeong's contributions to plasma etching technology highlight his innovative spirit and dedication to improving manufacturing processes. His patent reflects a significant advancement in the industry, showcasing the importance of research and development in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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