The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2023
Filed:
Jul. 17, 2018
Applicant:
Komico Ltd., Anseong-si, KR;
Inventors:
Assignee:
KOMICO LTD., Anseong-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/30 (2006.01); C23C 14/58 (2006.01); C23C 14/18 (2006.01); C23C 14/34 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/5806 (2013.01); C23C 14/185 (2013.01); C23C 14/30 (2013.01); C23C 14/34 (2013.01); H01L 21/67069 (2013.01); H01J 37/32642 (2013.01); H01J 2237/0203 (2013.01); H01J 2237/334 (2013.01);
Abstract
The present invention provides a photoplasma etching device and a method of manufacturing the same, and more particularly to a member for a plasma etching device, which is improved in plasma resistance through deposition of a rare-earth metal thin film and surface heat treatment and the optical transmittance of which is maintained, thus being useful as a member for analyzing the end point of an etching process, and a method of manufacturing the same.