Company Filing History:
Years Active: 2000-2001
Title: The Innovations of Dong-yun Kim
Introduction
Dong-yun Kim is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work primarily focuses on methods that enhance the efficiency and effectiveness of semiconductor devices.
Latest Patents
Dong-yun Kim's latest patents include innovative methods for etching metal films and forming interconnection lines in semiconductor devices. One of his notable patents is a method for etching a metal film containing aluminum, which utilizes a hard mask. This method involves forming a metal film on a semiconductor substrate, applying a hard mask pattern, and etching the metal film using an etching gas that includes carbon. This approach eliminates the need for a capping layer for the etched metal layer when the hard mask is made of an oxide or nitride film. Another significant patent is related to the formation of intermetal dielectric layers with low dielectric constants. This method involves creating a dielectric insulating layer and subsequently removing hydrogen bonds to enhance its properties.
Career Highlights
Dong-yun Kim is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to contribute to cutting-edge technologies that are essential for modern electronic devices.
Collaborations
Throughout his career, Dong-yun Kim has collaborated with notable colleagues, including Ho Ko and Tae-ryong Kim. These collaborations have further enriched his research and development efforts in the semiconductor field.
Conclusion
Dong-yun Kim's innovative work in semiconductor technology has led to significant advancements in the industry. His patents reflect a commitment to improving the efficiency of semiconductor devices, making him a valuable contributor to the field.