Company Filing History:
Years Active: 2009
Title: **Innovations by Dong-Xuan Lu: A Pioneer in Wafer Cleaning Technologies**
Introduction
Dong-Xuan Lu, a notable inventor from Miaoli Hsien, Taiwan, has made significant contributions to the field of semiconductor manufacturing. With a focused expertise on wafer cleaning processes, Lu has been instrumental in developing innovative methods that enhance production efficiency within the industry.
Latest Patents
Dong-Xuan Lu holds a patent titled "Methods of Spin-On Wafer Cleaning." This invention outlines a method for cleaning semiconductor wafers by regulating spin speed in conjunction with vertical water jet pressure. Specifically, the method details maintaining the vertical jet pressure and spin speed in inverse proportion. The innovation allows for wafer spin speeds ranging from 50 to 1200 rpm and vertical wafer jet pressures between 0.05 to 100 KPa, showcasing a remarkable advancement in wafer cleaning technology.
Career Highlights
Lu is associated with Taiwan Semiconductor Manufacturing Company Limited, a global leader in the semiconductor industry. His role at such a prestigious company underscores his dedication and expertise in the field. His patent demonstrates his commitment to improving cleaning methodologies, which are crucial for the fabrication of high-performance semiconductors.
Collaborations
Throughout his career, Dong-Xuan Lu has collaborated with esteemed colleagues such as Jun Wu and Shih-Chi Lin. These professional relationships have fostered an environment of innovation and advancement, further contributing to breakthroughs in semiconductor technology.
Conclusion
Dong-Xuan Lu's contributions to wafer cleaning technology mark him as a key inventor in the semiconductor industry. His patent not only reflects his ingenuity but also his commitment to advancing manufacturing processes. As the industry continues to evolve, the significance of innovations like Lu's will undoubtedly pave the way for future advancements in this critical field.