Dong-Woo Han

Title: Innovations of Dong-Woo Han in Semiconductor Technology

Introduction

Dong-Woo Han is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of FinFET devices. With a total of 2 patents, his work has been instrumental in advancing semiconductor fabrication methods.

Latest Patents

Dong-Woo Han's latest patents include innovative methods for fabricating FinFET semiconductor devices that incorporate dummy structures. The first patent describes a semiconductor device featuring a first active fin and a second active fin that protrude from a substrate and extend along a specific direction. It also includes a first gate structure on the first active fin and a second gate structure on the second active fin, with a dummy structure positioned between them. The second patent reiterates similar advancements in FinFET semiconductor devices, emphasizing the importance of these structures in enhancing device performance.

Career Highlights

Dong-Woo Han is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His role involves research and development in semiconductor technologies, where he applies his expertise to create cutting-edge solutions.

Collaborations

Throughout his career, Dong-Woo Han has collaborated with notable colleagues, including Bok-Young Lee and Jeong-yun Lee. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Dong-Woo Han's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the field. His advancements in FinFET devices are paving the way for future developments in semiconductor fabrication.