Dong-Won Hwang

Title: Innovations by Dong-Won Hwang

Introduction

Dong-Won Hwang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of etching solutions and compositions.

Latest Patents

Hwang holds 2 patents that showcase his innovative approaches. His first patent is titled "Composition for etching silicon oxide and method of forming a contact hole using the same." This composition includes from about 0.01 to about 2 percent by weight of ammonium bifluoride, from about 2 to about 35 percent by weight of an organic acid, from about 0.05 to about 1 percent by weight of an inorganic acid, and a remainder of a low polar organic solvent. This formulation aims to reduce damages to a metal silicide pattern during the etching process for forming contact holes.

His second patent, "Etching solution for silicon oxide method of manufacturing a semiconductor device using the same," describes an etching solution that can be used to enlarge openings formed through a silicon oxide layer. This solution includes about 0.2 to about 5.0 percent by weight of a hydrogen fluoride solution, about 0.05 to about 20.0 percent by weight of an ammonium fluoride solution, and about 40.0 to about 70.0 percent by weight of an alkyl hydroxide solution, with the remainder being water. This etching solution is designed to etch the silicon oxide layer without damaging the exposed metal silicide layer.

Career Highlights

Throughout his career, Dong-Won Hwang has worked with prominent companies such as Samsung Electronics Co., Ltd. and Cheil Industries Inc. His experience in these organizations has contributed to his expertise in semiconductor manufacturing processes.

Collaborations

Hwang has collaborated with notable colleagues, including Hun-Jung Yi and Kwang-Shin Lim. These partnerships have likely enhanced his innovative capabilities and contributed to his successful patent applications.

Conclusion

Dong-Won Hwang's contributions to semiconductor technology through his patents reflect his innovative spirit and expertise in the field. His work continues to influence advancements in manufacturing processes.