This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015.
Company Filing History:
Years Active: 2015
Title: The Innovations of Dong-Whan Ko
Introduction: Dong-Whan Ko is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in device fabrication.
Latest Patents: Dong-Whan Ko holds a patent for a method of fabricating a semiconductor device. This method includes forming a passivation film along the side wall of a via hole. The process involves sequentially forming an etch stop film and an insulating film on a substrate. It also includes forming a conductive mask pattern with a first opening on the insulating film. The via-hole is created using the conductive mask pattern as an etch mask, exposing the etch stop film. After removing the conductive mask pattern, a passivation film is formed along the side wall of the via-hole.
Career Highlights: Dong-Whan Ko is currently employed at Samsung Electronics Co., Ltd. His work at this leading technology company has allowed him to contribute to cutting-edge innovations in semiconductor devices. His expertise in this area has been recognized within the industry.
Collaborations: One of his notable coworkers is Hong-Jae Shin. Their collaboration has likely contributed to the advancements in semiconductor technology at Samsung Electronics.
Conclusion: Dong-Whan Ko's contributions to semiconductor device fabrication highlight his innovative spirit and technical expertise. His patent reflects the ongoing advancements in technology that are essential for the future of electronics.
