Yongin-si, South Korea

Dong-Seok Nam

USPTO Granted Patents = 12 

Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 57(Granted Patents)


Location History:

  • Seoul, KR (2004 - 2011)
  • Yongin-si, KR (2012 - 2015)

Company Filing History:


Years Active: 2004-2015

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12 patents (USPTO):

Title: Innovations by Dong-Seok Nam in Phase Shift Mask Technologies

Introduction

Dong-Seok Nam, an accomplished inventor based in Yongin-si, South Korea, has made significant contributions to the field of optics and photomask technology. With a remarkable portfolio of 12 patents, he has been at the forefront of innovation, particularly in the development of advanced phase shift masks. His work has garnered attention for its potential to enhance the precision and efficiency of optical devices.

Latest Patents

Among Dong-Seok Nam's recent patents are notable innovations in phase shift masks and methods of forming these masks. One such patent describes a phase shift mask featuring a combination of transparent layers, phase shift patterns, and transmittance control layers. This innovative design aims to mitigate haze effects through the use of an alkaline cleaning solution, paving the way for improved performance in optical applications.

Another significant patent relates to halftone phase shift blank photomasks, which consist of a substrate designed to transmit light. The design includes both a shift pattern on the substrate and a light shielding pattern in the peripheral blind area, enabling partial light transmission. The advancements represented in these patents illustrate Dong-Seok Nam's commitment to pushing the boundaries of photomask technology.

Career Highlights

Dong-Seok Nam's career has been marked by his tenure at Samsung Electronics Co., Ltd., a leading technology company known for its advanced research and development initiatives. His position within the organization has allowed him to apply his inventive skills in practical contexts, contributing to the company's overall advancements in optical technology.

Collaborations

Throughout his career, Dong-Seok Nam has collaborated with talented professionals, including Hoon Tae Kim and Sang-Gyun Woo. Working alongside such esteemed colleagues has facilitated knowledge exchange and has been pivotal in fostering innovative ideas that lead to groundbreaking inventions in the photomask arena.

Conclusion

In conclusion, Dong-Seok Nam's impressive body of work in the realm of phase shift masks and related technologies underscores his role as a pivotal figure in the field. His patents not only highlight his inventive prowess but also demonstrate significant potential for advancements in optical systems. As technology continues to evolve, Dong-Seok Nam's contributions will likely play an essential role in shaping the future of photomask applications.

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