Dong-Seok Baek

Title: Innovations of Dong-Seok Baek

Introduction

Dong-Seok Baek is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of exposure apparatus technology. With a total of 3 patents to his name, Baek's work has been instrumental in advancing the precision and efficiency of exposure processes.

Latest Patents

Baek's latest patents include a method of aligning an exposure apparatus and a method of exposing a photoresist film using the same. These innovations involve assigning an origin of a reference coordinate system to one of several center points. Center point coordinates are then assigned to the remaining center points, ensuring that reference marks correspond to the center points of multiple microscopes fixed to a base. Additionally, beam position detection marks are strategically placed between reference marks and exposure points of exposure heads. This design allows for the easy and accurate performance of alignment, which is particularly effective for increasingly larger apparatuses.

Career Highlights

Dong-Seok Baek is currently employed at Samsung Electronics Co., Ltd., where he continues to develop cutting-edge technologies. His work has garnered attention for its practical applications in the semiconductor industry, particularly in enhancing the capabilities of exposure systems.

Collaborations

Baek has collaborated with notable colleagues, including Sang-Hyun Park and Sang-Don Jang. These partnerships have contributed to the successful development of innovative solutions in their field.

Conclusion

Dong-Seok Baek's contributions to exposure apparatus technology exemplify the impact of innovation in the semiconductor industry. His patents reflect a commitment to improving precision and efficiency in complex systems.