Samsung Electronics Co., Ltd.

Dong-Seok Baek

Ki-Hyun Kim

Sang-Hyun Park

Sang-Don Jang

Sang-min Lee

Dong-Min Kim

Sang-Min Lee

Chang-Hoon Choi

Dong-min Kim

Ho-seok Choi

Hwa-sub Shim

Hee-soo Pyun

An origin of a reference coordinate system is assigned to one of a plurality of center points, and center point coordinates according to the reference coordinate system are assigned to remaining center points, so that reference marks successively correspond to center points of a plurality of microscopes fixed to a base. Beam position detection marks disposed between the reference marks with exposure points of exposure heads fixed to the base are crossed to assign beam coordinates according to the reference coordinate system to the exposure points. Thus, alignment may be easily and accurately performed, and is effective for increasingly larger apparatuses.

Method of aligning an exposure apparatus, method of exposing a photoresist film using the same and exposure apparatus for performing the method of exposing a photoresist film

An apparatus to inspect a TFT substrate including a gate line, a data line crossed with the gate line and insulated from the gate line, a TFT disposed at an intersection of the gate line and the data line, and a pixel electrode connected to the TFT includes a vacuum chamber, a stage disposed in the vacuum chamber and on which the TFT substrate is settled, an electron beam generator disposed over the stage, a gate driving part to apply a gate-on voltage to the gate line to turn on the TFT, a signal detector connected to the data line and to sense an electric signal from the pixel electrode, and a controller to control the gate driving part and the electron beam generator so that a electron beam is irradiated to the pixel electrode while the TFT is turned on.

Apparatus to inspect TFT substrate and method of inspecting TFT substrate

Growing community of inventors

Suwon-si, South Korea

Dong-Seok Baek