This inventor holds 1 USPTO granted patent. Top assignees: Huawei Technologies Canada Co., Ltd., Other. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 16 
1 out of 834,708 Years Active: 2026
Title: Dong Seob Chung: Inventor in Quantum-Dot LED Technology
Introduction
Dong Seob Chung is an inventor associated with Waterloo, Canada. His patent work concerns a treatment process for metal oxide layers used in quantum-dot light-emitting diode (QDLED) devices. His record includes 1 patent.
Latest Patents
Chung’s patent, “Process for the Halogen Treatment of Metal Oxide Layers,” describes treating the zinc oxide (ZnO) electron transport layer (ETL) in a QDLED with fluorine. The process can expose the ZnO layer to a fluorine plasma, including plasma generated from fluorine-containing gases, or to another suitable fluorine-containing substance, such as fluorine gas or fluorinated solvents. According to the patent description, fluorine plasma treatment can improve the device’s external quantum efficiency (EQE) and electroluminescence (EL) stability.
Career Highlights
Chung is associated with Huawei Technologies Canada Co., Ltd. His patent reflects work on materials processing for QDLED devices, particularly methods intended to improve device performance and stability.
Collaborations
Hany Maher Aziz is identified as Chung’s coworker. The patent’s technical focus is the fluorine treatment of ZnO layers for use in QDLEDs.
Conclusion
Dong Seob Chung’s patent documents an approach to improving QDLED performance by applying fluorine treatment to zinc oxide layers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile