Dong-ok Shin

Title: The Innovative Contributions of Dong-ok Shin

Introduction

Dong-ok Shin is a prominent inventor based in Seoul, South Korea. He is recognized for his significant contributions to the field of nano-patterning and polymer technology. His innovative work has led to advancements in manufacturing processes for polarizers and color filters.

Latest Patents

Dong-ok Shin holds a patent titled "Method of nano-patterning block copolymers and method of manufacturing polarizer and color filter using the same." This patent describes a method for nano-patterning block copolymers, which involves coating block copolymers on a substrate to a predetermined thickness. The process includes forming a thickness gradient by patterning the block copolymers to achieve a specific aspect ratio. Furthermore, it details how to align self-assembled block copolymers in the direction of the thickness gradient through heat treatment. He has 1 patent to his name.

Career Highlights

Throughout his career, Dong-ok Shin has worked with leading organizations, including Samsung Electronics and the Korea Advanced Institute of Science and Technology. His experience in these institutions has allowed him to collaborate with other experts in the field and contribute to groundbreaking research and development.

Collaborations

Some of his notable coworkers include Sang-ouk Kim and Su-Mi Lee. Their collaborative efforts have further enhanced the impact of his work in the industry.

Conclusion

Dong-ok Shin's innovative methods in nano-patterning and polymer technology have made a significant impact on the manufacturing of polarizers and color filters. His contributions continue to influence advancements in the field, showcasing the importance of innovation in technology.