The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Feb. 05, 2008
Sang-ouk Kim, Daejeon, KR;
Su-mi Lee, Yongin-si, KR;
Moon-gyu Lee, Suwon-si, KR;
Bong-hoon Kim, Seoul, KR;
Dong-ok Shin, Seoul, KR;
Sang-ouk Kim, Daejeon, KR;
Su-mi Lee, Yongin-si, KR;
Moon-gyu Lee, Suwon-si, KR;
Bong-hoon Kim, Seoul, KR;
Dong-ok Shin, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Abstract
Provided is a method of nano-patterning block copolymers and a method of manufacturing a polarizer using the same. The method of nano-patterning block copolymers includes coating block copolymers on a lower substrate to a predetermined thickness, forming a thickness gradient by patterning the block copolymers to have a predetermined aspect ratio, and aligning self-assembled block copolymers in a direction of the thickness gradient by heat-treating the block copolymers having the thickness gradient.